Instruments and Systems: Monitoring, Control, and Diagnostics Annotation << Back Mathematical Model and Control Algorithms for Non-Standard Reagent Dosing Processes in Galvanic Production A.S. ZHURAVLEV This article develops a mathematical model and control algorithm for non-standard reagent dosing processes in galvanic production. The proposed model is described by a modified Torricelli equation for flow through orifice plates, a material balance equation, and a formula proportionality equation, along with dynamic system delay. Control is implemented using an adaptive PID controller with feedback for pH, temperature, and conductivity. Simulation modeling in MATLAB/Simulink showed that with optimal coefficients of Kp = 2.0; Ki = 1.0; Kd = 0.5, the system stabilizes within 4–5 seconds without significant overshoot and completely eliminates static error. A comparative analysis confirmed the superiority of the adaptive PID controller over a simple P-controller (8-10 times higher accuracy), a non-adaptive PID (reducing the impact of environmental variations by 25–30 %), and more complex methods (fuzzy logic, MPC) with significantly lower computational load. Implementation of the developed solution ensures dosing accuracy of up to ±0.1 %, a 10–15 % reduction in reagent consumption, and the ability to fully automate non-standard galvanic processes. Keywords: electroplating production, reagent dosing, mathematical model, adaptive PID controller, simulation modeling, dosing accuracy, automation of technological processes. DOI: 10.25791/pribor.2.2026.1651 Pp. 38-43.